Witrynagroup assignment presenting group members name- NUR FAKRAH - KASIH LATIFAH - SHIRIN RAIHANA - NUR AMIRAH - ALIYA SYAKIRAH WitrynaA method of forming a semiconductor device includes: forming a semiconductor feature over a substrate, the semiconductor feature includes a conductive region; forming a dielectric layer over the semiconductor feature; patterning the dielectric layer to form a contact opening exposing a top surface of the conductive region; forming a monolayer …

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